Kumar, Sunil, Rawal, D. S., Malik, Hitendra K., Sanwal, Rajeev, Khan, S. A., Vinayak, Seema. (1398). Memory effect in silicon nitride deposition using ICPCVD technique. , 13(4), 299-304. doi: 10.1007/s40094-019-00354-4
Sunil Kumar; D. S. Rawal; Hitendra K. Malik; Rajeev Sanwal; S. A. Khan; Seema Vinayak. "Memory effect in silicon nitride deposition using ICPCVD technique". , 13, 4, 1398, 299-304. doi: 10.1007/s40094-019-00354-4
Kumar, Sunil, Rawal, D. S., Malik, Hitendra K., Sanwal, Rajeev, Khan, S. A., Vinayak, Seema. (1398). 'Memory effect in silicon nitride deposition using ICPCVD technique', , 13(4), pp. 299-304. doi: 10.1007/s40094-019-00354-4
Kumar, Sunil, Rawal, D. S., Malik, Hitendra K., Sanwal, Rajeev, Khan, S. A., Vinayak, Seema. Memory effect in silicon nitride deposition using ICPCVD technique. , 1398; 13(4): 299-304. doi: 10.1007/s40094-019-00354-4


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