Hajakbari, F., Rashvand, S., Hojabri, A.. (1398). Effect of plasma oxidation parameters on physical properties of nanocrystalline nickel oxide thin films grown by two-step method: DC sputtering and plasma oxidation. , 13(4), 365-373. doi: 10.1007/s40094-019-00350-8
F. Hajakbari; S. Rashvand; A. Hojabri. "Effect of plasma oxidation parameters on physical properties of nanocrystalline nickel oxide thin films grown by two-step method: DC sputtering and plasma oxidation". , 13, 4, 1398, 365-373. doi: 10.1007/s40094-019-00350-8
Hajakbari, F., Rashvand, S., Hojabri, A.. (1398). 'Effect of plasma oxidation parameters on physical properties of nanocrystalline nickel oxide thin films grown by two-step method: DC sputtering and plasma oxidation', , 13(4), pp. 365-373. doi: 10.1007/s40094-019-00350-8
Hajakbari, F., Rashvand, S., Hojabri, A.. Effect of plasma oxidation parameters on physical properties of nanocrystalline nickel oxide thin films grown by two-step method: DC sputtering and plasma oxidation. , 1398; 13(4): 365-373. doi: 10.1007/s40094-019-00350-8


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