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Structural and morphological properties of ITO thin films grown by magnetron sputtering | ||
Journal of Theoretical and Applied Physics | ||
مقاله 5، دوره 9، شماره 4، اسفند 2015، صفحه 285-290 اصل مقاله (1.17 M) | ||
شناسه دیجیتال (DOI): 10.1007/s40094-015-0187-3 | ||
نویسندگان | ||
Z. Ghorannevis 1؛ E. Akbarnejad2؛ M. Ghoranneviss2 | ||
1Department of Physics, Karaj Branch, Islamic Azad University | ||
2Plasma Physics Research Centre, Science and Research Branch, Islamic Azad University | ||
چکیده | ||
AbstractPhysical properties of transparent and conducting indium tin oxide (ITO) thin films grown by radiofrequency (RF) magnetron sputtering are studied systematically by changing deposition time. The X-ray diffraction (XRD) data indicate polycrystalline thin films with grain orientations predominantly along the (2 2 2) and (4 0 0) directions. From atomic force microscopy (AFM) it is found that by increasing the deposition time, the roughness of the film increases. Scanning electron microscopy (SEM) images show a network of a high-porosity interconnected nanoparticles, which approximately have a pore size ranging between 20 and 30 nm. Optical measurements suggest an average transmission of 80 % for the ITO films. Sheet resistances are investigated using four-point probes, which imply that by increasing the film thickness the resistivities of the films decrease to 2.43 × 10−5 Ω cm. | ||
کلیدواژهها | ||
Indium tin oxide؛ Magnetron sputtering؛ Thickness | ||
آمار تعداد مشاهده مقاله: 51 تعداد دریافت فایل اصل مقاله: 56 |